Preparative Methods for Nanoanalysis of Materials with Focused Ion Beam Instruments

Focused Ion Beam Lithography

Nanoimprint Mold Manufacturing with Focused Ion Beam

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-45 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key challenge in expense and resolution. Focused Ion Beams (FIB) has been known for high resolution but low throughput work in TEM sample preparation, and its extremely well defined 7 nm diameter Ga beam make it als...

Focused ion beam and scanning electron microscopy for 3D materials characterization

In this article, we review focused ion beam serial sectioning microscopy paired with analytical techniques, such as electron backscatter diffraction or x-ray energy-dispersive x-ray spectrometry, to study materials chemistry and structure in three dimensions. These three-dimensional microanalytical approaches have been greatly extended due to advances in software for both microscope control and...

Focused Ion Beam Microscopy and Micromachining

The FIB Instrument The basic functions of the FIB, namely, imaging and sputtering with an ion beam, require a highly focused beam. A consistent tenet of any focused beam is that the smaller the effective source size, the more current that can be focused to a point. Unlike the broad ion beams generated from plasma sources, high-resolution ion beams are defined by the use of a field ionization so...

Sculpting on polymers using focused ion beam

Available online 13 June 2008 It has been recently shown t